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Technical Paper
Mar. 19, 2016
Technical Paper
Effect of the formation temperature of the AlN/Si interface on the vertical-direction breakdown voltages of AlGaN/GaN HEMTs on Si substrates MRS Advances
Mar. 17, 2016
News
UCSB SSLEEC selects TNSC's SR4000HT MOCVD reactor for deep ultra violet light emitting diode (UVCLED) development.
Mar. 06, 2016
Technical Paper
Breakdown electric field of each layer in AlGaN/GaN high-electron-mobility transistors on Si substrates Isplasma 2016
Feb. 22, 2016
Events
Taiyo Nippon Sanso is planning a presentation during the poster session at the 2016 MRS Spring Meeting & Exhibit from March 28 to April 1 at the Phoenix Convention Center.
The topic will be “Variation of Vertical Direction Breakdown Voltage of the AlGaN/GaN HEMTs on AlN/Si Template Substrate as a Function of the Growth Temperature of the Initial Al Layer.”
Feb. 22, 2016
Events
Taiyo Nippon Sanso is planning a presentation during the 63rd JSAP Spring Meeting, 2016 from March 19 to 22 at the Tokyo Institute of Technology.
The topic will be “Relationship between Al compositions of AlGaN buffer layer and vertical leakage current of AlGaN/GaN HEMT on Si substrate.”
Feb. 22, 2016
Events
Taiyo Nippon Sanso is planning a presentation during the ISPlasma symposium from March 6 to 10, 2016 at Nagoya University.
The topic will be “Breakdown electric field of each layer in AlGaN/GaN high-electron-mobility transistors on Si substrates.”
Oct. 06, 2015
Events
Taiyo Nippon Sanso is planning a presentation during the oral cession IEICE Technical Committee from November 26 to 27, 2015 at Osaka City University Media center in Osaka, Japan.
Topic will be "Dependence of the initial AlN layer of the vertical direction leakage current of the AlGaN/GaN HEMT structure on Silicon substrate"
Oct. 06, 2015
Events
Taiyo Nippon Sanso is planning a presentation at The 6th International Symposium on Growth of Ⅲ-Nitrides from November 8 to 13, 2015 at Act City Hamamatsu in Hamamatsu, Japan.
Topic of the poster session will be "Si-doped Al0.6Ga0.4N with low carbon concentration at high growth rate using high-speed-flow MOVPE reactor"
Topic of the keynote lecture will be "Opportunities and Challenges to GaN MOCVD for Electron Devices"
Oct. 06, 2015
Events
Taiyo Nippon Sanso is planning a presentation during the oral session at The 9th International Workshop on Bulk Nitride Semiconductors from November 2 to 6, 2015 at Oak Valley in Wonju, South Korea.
Topic will be "Low C and Si residual concentration of GaN grown on GaN Substrates by MOCVD"
Oct. 01, 2015
Technical Paper
NEW TYPE MOCVD SYSTEM “SR4000HT”
Sep. 01, 2015
Events
Taiyo Nippon Sanso is planning a presentation during the poster session at the 76th JSAP Autumn Meeting 2015 from September 13 to 16, 2015 at Nagoya Congress Center in Nagoya, Japan.
The topics will be "Growth of n-type AlGaN (Al>0.5) at high rate using high-speed-flow MOCVD" and "Relationship between AlN layer and vertical breakdown voltage of AlGaN/GaN HEMT on Si substrate".
Aug. 23, 2015
Technical Paper
Correlation of the initial AlN layer and vertical direction current leakage of AlGaN/GaN high-electron-mobility transistors (HEMTs) on Si substances
Advance copy for the 11th Topical Workshop on Heterostructure Microelectronics (Poster Session)
Aug. 04, 2015
Events
Taiyo Nippon Sanso plans to have a booth at the Workshop on Ultra-Precision Processing for Wide Bandgap Semiconductors (WUPP) from August 20 to 21, 2015 at Hilton Fukuoka Sea Hawk in Fukuoka, Japan.
Aug. 04, 2015
Events
Taiyo Nippon Sanso plans to have a booth at the 11th Topical Workshop on Heterostructure Microelectronics (TWHM) from August 23 to 26, 2015 at Hida Hotel Plaza in Takayama, Japan.
It is also planning to participate in the poster session on the topic of "Correlation of initial AlN layer and vertical direction current leakage of AlGaN/GaN high-electron-mobility transistors (HEMTs) on Si substances".
Aug. 04, 2015
Events
Taiyo Nippon Sanso plans to have a booth at the 11th International Conference on Nitride Semiconductors (ICNS-11) from August 30 to September 4, 2015 at the Beijing International Convention Center in Beijing, China.
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Mar. 18, 2026
News
Website Relaunch Announcement
Sep. 24, 2025
News
Corporate Name Change Announcement
May 20, 2025
News
Realization of Controlled n-Type Doping of β-Ga2O3 Homoepitaxial Layers via a Proprietary MOVPE
Key Technology for Mass-Production of Next-Generation Power Devices
Apr. 11, 2025
News
Lund University Selects Taiyo Nippon Sanso MOCVD Platform for Research and Development of Advanced Oxide Materials and Devices
Mar. 31, 2025
News
University of South Carolina Selects Taiyo Nippon Sanso MOCVD Platform for Research and Development of Advanced Nitride Materials and Devices
Oct. 11, 2024
News
Ohio State University Selects Taiyo Nippon Sanso MOCVD and HVPE Platforms for Research and Development of Advanced Nitride and Oxide Materials and Devices
Jun. 20, 2024
News
Lit Thinking Selects Taiyo Nippon Sanso MOCVD Platform to Enable New UVLED Technologies and Commercial Products
Apr. 22, 2024
News
Innovation Unit, CSE Department will move from Shiba Office to Minatomirai Office. Business will resume on May 1.
Jun. 30, 2023
News
Production Efficiency Improved by 2X Compared to Conventional Systems, Announcement of the Release of the UR26K-CCD for Mass Production GaN MOCVD Systems
Feb. 07, 2023
News
Taiyo Nippon Sanso sponsored, and also exhibited at, IWN 2022 in Berlin, Germany from October 9 (Sun) to 14 (Fri), 2022 and IWGO 2022 in Nagano prefecture from October 23 (Sun) to 27 (Thu). (English translation of TNSC house journal, January 2023)
Oct. 31, 2022
News
Taiyo Nippon Sanso conducted a presentation at the 41st Electronic Materials Symposium (EMS-41), held in Nara, Japan from October 19 (Wed) to 21 (Fri), 2022.
Topic: In-plane uniformity control of Al composition and thickness for AlGaN-based Far-UVC LEDs growth
Sep. 26, 2022
News
Taiyo Nippon Sanso is becoming a Gold Sponsor for the Harold M. Manasevit Young Investigator Award, which recognises seminal contributions in MOCVD technology and research.
Jun. 29, 2022
News
We have begun epitaxy using the newly-developed FR2000-OX Ga2O3 MOCVD system.
Apr. 20, 2022
News
Taiyo Nippon Sanso Ga2O3 MOCVD System Installed and Qualified for Operation at Tokyo University of Agriculture and Technology
Apr. 07, 2022
News
Taiyo Nippon Sanso and RIKEN demonstrate MOCVD AlGaN-based deep ultraviolet LED EL emission at 226nm
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Jun. 24, 2025
Events
Taiyo Nippon Sanso is Proud to Sponsor the 15th International Conference on Nitride Semiconductors (ICNS-15) in Malmö, Sweden from July 6 (Sun) to 11 (Fri), 2025.
Oral Presentation
●Booth No.: 20
●Topic: Advanced High-Flow-Velocity Horizontal MOCVD Technology for Nitride Semiconductor Growth
Sep. 24, 2024
Events
Taiyo Nippon Sanso will be sponsoring (at Gold Level), exhibiting and holding presentations at the International Workshop on Nitride Semiconductors (IWN 2024), on the island of O'ahu, Hawai'i, USA from November 3 (Sun) to 8 (Fri), 2024.
Oral Presentation
●Booth No.: Not Fixed
●Topic-1: Demonstration of MOCVD System with Advanced Mass Production Performance
●Topic-2: Demonstration of AlScN Growth Using Commercial-Grade MOCVD Equipment Compatible with Low Vapor Pressure Precursor Supply
Mar. 11, 2024
Events
Taiyo Nippon Sanso will be sponsoring (Platinum Level), exhibiting and holding presentations at the International Workshop on Gallium Oxide and Related Materials (IWGO), in Berlin, Germany from May 26 (Sun) to 31 (Fri), 2024.
Oral Presentation
●Booth No.: Not Fixed
●Topic: Growth of Si-doped β-Ga2O3 thick layers by low-pressure hot-wall MOVPE using tetramethylsilane as a doping gas
●Date & Time: Not fixed
Mar. 04, 2024
Events
Taiyo Nippon Sanso will be sponsoring, exhibiting and holding presentations at the 21st International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE XXI), in Las Vegas, Nevada, USA from May 12 (Sun) to 17 (Fri), 2024.
Mar. 04, 2024
Events
Taiyo Nippon Sanso will be sponsoring the 7th U.S. Gallium Oxide Workshop (GOX 2024), to be held in Columbus, Ohio, USA from August 5 (Mon) to 7 (Wed), 2024.
Dec. 07, 2023
Events
Taiyo Nippon Sanso will be giving a presentation at the SPIE Photonics West, to be held in San Francisco, California, USA from January 27 (Sat) to February 1 (Thu), 2024.
Oral Presentation
●Topic: Crack-free growth of UVC LEDs on 6-inch sapphire substrates using face-to-face high-temperature annealed AlN by production scale MOCVD (Invited Paper)
●Date & Time: Feb. 1 (Thu) 11:30AM-12:00PM PST
Nov. 09, 2023
Events
Taiyo Nippon Sanso will be presenting a poster at and sponsoring the 14th International Conference on Nitride Semiconductors (ICNS-14), to be held in Fukuoka, Japan from November 12 (Sun) to 17 (Fri), 2023.
Poster Presentation
●Topic: Development of a MOCVD system with an integrated cleaning system and improved efficiency for the mass production of GaN epi-wafers
●Date & Time: Nov. 16 (Thu) 16:20-18:10 JST
Jul. 14, 2023
Events
Taiyo Nippon Sanso will be proud to be a bronze sponsor for the 6th U.S. Workshop on Gallium Oxide (GOX 2023), to be held in Buffalo, New York, USA from Aug 13 (Sun) to 16 (Wed), 2023.
Jun. 08, 2023
Events
Taiyo Nippon Sanso will be sponsoring the 23rd American Conference on Crystal Growth and Epitaxy (ACCGE-23) and the 21st US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-21), to be held in Tucson, Arizona, USA from Aug 13 (Sun) to 18 (Fri), 2023.
Apr. 17, 2023
Events
Taiyo Nippon Sanso will be sponsoring and conducting a presentation at the 6th International Workshop on Ultraviolet Materials and Devices (IWUMD 2023), to be held in Metz, France from June 5 (Mon) to 8 (Thu), 2023.
Feb. 16, 2023
Events
Taiyo Nippon Sanso will be sponsoring and conducting a presentation at the 15th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2023), to be held in Gifu, Japan from March 5 (Sun) to 9 (Thu), 2023.
Oral Presentation
●Topic: Epitaxial growth for AlGaN-based deep-ultraviolet light-emitting diodes on 6-inch sputter-annealed AlN template by using a mass production MOCVD system
●Date & Time: Mar. 8 (Wed) 10:45-11:00 JST
Feb. 16, 2023
Events
Taiyo Nippon Sanso will be exhibiting at the International Conference on Compound Semiconductor Manufacturing Technology (2023 CS MANTECH), to be held in Orlando, USA from May 15 (Mon) to 18 (Thu), 2023.
Jan. 26, 2023
Events
Taiyo Nippon Sanso will be sponsoring the Ohio State Materials & Manufacturing Conference 2023, to be held in Ohio, USA from May 9 (Tue) to May 11 (Thu), 2023.
Sep. 01, 2022
Events
Taiyo Nippon Sanso will be sponsoring and exhibiting at the International Workshop on Gallium Oxide and Related Materials (IWGO2022) in Nagano, Japan from October 23 (Sun) to 27 (Thu), 2022.
Sep. 01, 2022
Events
Taiyo Nippon Sanso will be sponsoring and exhibiting at the International Workshop on Nitride Semiconductors (IWN2022) in Berlin, Germany from October 9 (Sun) to 14 (Fri), 2022.
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Dec. 06, 2025
Tech Voice
Hiroshi Amano – The World of LED
Mar. 31, 2025
Tech Voice
coming soon
Mar. 31, 2025
Tech Voice
coming soon
Feb. 01, 2017
Technical Paper
Characteristics of AlN Layer on 4 inch Sapphire Substrate by High Temperature Annealing in Nitrogen Atmosphere
Jan. 05, 2017
Technical Paper
Influence of the Al content of the AlGaN buffer layer in AlGaN/GaN high-electron-mobility transistor structures on a Si substrate
Oct. 07, 2016
Technical Paper
Regrowth of High-Al-content AlGaN and AlN on High-quality AlN Template Fabricated by Annealing at 1700 ℃ under Nitrogen Ambient
Oct. 07, 2016
Technical Paper
Impact of crystal quality of AlN nucleation layer on the vertical direction breakdown voltage of AlGaN/GaN high-electron-mobility transistor structures on Si
Aug. 30, 2016
Technical Paper
Study of carbon concentration in GaN grown by metalorganic chemical vapor deposition
Aug. 28, 2016
Technical Paper
Challenge and Opportunity of high-flow rate MOCVD tool for UV-LED Application
Aug. 28, 2016
Technical Paper
High quality Al0.6Ga0.4N and AlN growth on AlN template with a high temperature annealing in N2 ambience
Jul. 10, 2016
Technical Paper
Characterization of AlN and Mg-doped AlxGa1-xN(x>0.2) Grown by Using Horizontal High-flow-rate MOVPE System 2016 ICMOVPE
Jun. 26, 2016
Technical Paper
Relationship between Al content of AlGaN buffer layer on top of initial AlN nucleation layer on Si and vertical leakage current of AlGaN/GaN highelectron-mobility transistor structures CSW 2016
Jun. 26, 2016
Technical Paper
Improvement of Crystalline Quality of AlN and High-Al-content AlGaN at High Growth Rate Using Horizontal High-flow-rate MOVPE System CSW 2016
Jun. 17, 2016
Technical Paper
GROWTH OF N-TYPE AlxGa1-xN (x>0.5) WITH LOW ELECTRIC RESISTIVITY AT HIGH V/III RATIO IWUMD 2016
Mar. 19, 2016
Technical Paper
Variation of vertical direction breakdown voltage of the AlGaN/GaN HEMTs on AlN/Si template substrate as a function of growth temperature of initial Al layer MRS2016 spring meeting (Poster Session)
Mar. 19, 2016
Technical Paper
Effect of the formation temperature of the AlN/Si interface on the vertical-direction breakdown voltages of AlGaN/GaN HEMTs on Si substrates MRS Advances
Mar. 06, 2016
Technical Paper
Breakdown electric field of each layer in AlGaN/GaN high-electron-mobility transistors on Si substrates Isplasma 2016
Oct. 01, 2015
Technical Paper
NEW TYPE MOCVD SYSTEM “SR4000HT”
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