SR4000HT Series

Wide Process Window MOCVD for Power and Optoelectronic Devices

The SR4000 series is an MOCVD system for GaN research and development. It has a wide range of growth conditions and can be customized to accommodate low vapor pressure raw materials.

SR4000HT-RR

Wide Process Window MOCVD for Power and Optoelectronic Devices Img

Advantages

High Growth Rates
Carbon Background Concentration Control and Flexibility
High InGaN Growth Temperature
High temperature controllability and uniformity
High Al Content AlGaN

Applications

HEMT, PN Diodes, Lasers, RGB to UV LED

SR4000HT series specifications

	SR4000HT	SR4000HT-RR
Reactor type	Face up, Horizontal flow with rotation
Wafer size	2"×3 or 4"×1
Heating system	Two zone, up to 1350℃
Gas nozzles	Three (3) laminar _ow horizontals
Gas nozzles	(Triple injection)
Growth pressure	10 kPa up to 100 kPa
Size	L6200, W1200, H2200	L4700, W1200, H1950
Size	Four (4) cabinets	Three (3) cabinets
Sourcses	Eight(8) metalorganic
Sourcses	Two(2) hydride lines