Tsukuba Laboratory

New R&D center under construction
(scheduled for completion in March 2027)

Established	July 1992
Location	10 Okubo, Tsukuba, Ibaraki, Japan
Site area	38,311 m²

Facility introduction

From Gas Technology to Value Creation.Where Challenges Become Differentiation.

In a world where technologies are mature, true innovation emerges from integration. At Tsukuba Laboratory, we combine gas technology with gas application engineering to explore areas others have yet to enter.

Small. Specialized. Irreplaceable.

Our goal is not scale for scale’s sake. We aim to be small, highly specialized, and irreplaceable. By addressing niche yet critical global challenges with deep technical understanding and practical implementation, we deliver value that endures in the field—not just in theory.

MOCVD as a service

At Tsukuba Laboratory, we can offer some types of demonstration MOCVD systems to support customer process evaluation and collaborative R&D activities. Our strength lies in offering customized solutions and expert consulting through advanced gas solution technology to solve their challenges.

Fail fast, learn faster, build what lasts.

We see failure as part of learning. By not fearing failure, we discover approaches others never consider.
Test. Break. Improve. Repeat.
This cycle drives real technological evolution.

Advanced Characterization Facilities

At the Tsukuba Laboratory, we possess a variety of characteristic evaluation tools for epitaxial growth of MOCVD in order to develop cutting-edge devices and provide solutions for customer satisfaction.

System	Key Capabilities
Optical Surface Analyzer	High-resolution surface inspection and defect analysis
Field Emission Scanning Electron Microscope (FE-SEM)	Nanoscale imaging of surface and cross-sectional structures
Atomic Force Microscope (AFM)	Atomic-level surface morphology and roughness measurement
PL Mapping System	Spatial mapping of photoluminescence properties
Hall Effect Measurement System	Carrier concentration and mobility characterization
EL Measurement System	Electroluminescence evaluation of device performance
Particle counter	Counts the number of particles on the wafer. In-situ monitoring also possible.